Microlithography Filtration PDA Reference 2003 (Mobile)

Overview:

Microlithography Filtration PDA ReferenceUpdated July 2003If you are involved in semiconductor manufacturing, this one's for you!This valuable, in-hand microlithography filtration reference from Pall Microelectronics gives you instant access to filter compatibility tables for essential solvents key to semiconductor manufacturing specific to the microlithography process, and more.The Pall Microlithography Filtration Tech Note includes a high-level process overview and covers technical issues, solvent surface tension vs wettability of filter membrane, and also includes info on gel removal, low operating pressure, and minimizing chemical waste and metal contamination. As a bonus, you'll also enjoy engineering-focused units conversions formulas/facts that will settle any argument - length, mass, volume, energy, force, pressure, stress, viscosity. You'll also be armed with engineering essential physical constants such as Avagadro's number, bohr radius, Faraday's constant, Plank's constant, speed of light in a vacuum, and more.Solvents:Acetone Aquatar BA - N-butyl acetate Cyclohexanone Developer less than 3% TMAH DMF - N,N-Dimethyl formamide EA ECA - Ethyl cellosolve acetate EEP - Ethyl3-ethoxypropionate EGMEA EL - Ethyl lactate EP Ethyl pyruvate IPA - Isopropyl alcohol MAK - 2-heptanone MEK - Methyl ethyl ketone MMP - Methyl 3-methoxypropionate NMP - N-Methylpyrrolidone PGMEA - Propylene glycol monomethyl ether acetate XyleneDownload now to arm yourself with this handy engineering-focused Microlithography Filtration PDA Reference compliments of Pall Microelectronics.

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